Journal
OPTICS LETTERS
Volume 44, Issue 24, Pages 5981-5984Publisher
OPTICAL SOC AMER
DOI: 10.1364/OL.44.005981
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Funding
- China Scholarship Council
- Natural Sciences and EngineeringResearch Council of Canada
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We propose a strategy to improve sensing performance of sub-wavelength-grating (SWG) waveguide-based sensors by introducing a substrate-overetch (SOE) geometry. The proposed SOE-SWG waveguide shows enhanced analyte interaction and a reduced group index, which improves the sensitivity of resonator-based sensors. The SiO2 overetch process was realized in Ar/C4F8/O-2 plasma for 40 sec with a SiO2/Si selectivity of 10:1, obtaining a 285-nm anisotropic overetch in the SiO2 layer. Sensor performance of the SOE-SWG architecture is characterized by using isopropyl alcohol solutions, indicating an enhanced bulk sensitivity up to 575 nm/RIU (479 nm/RIU before the SOE), and a maximum waveguide mode sensitivity larger than one. (C) 2019 Optical Society of America
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