Journal
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
Volume 583, Issue -, Pages -Publisher
ELSEVIER
DOI: 10.1016/j.colsurfa.2019.123912
Keywords
Evaporation; Droplet evaporation; Evaporation residues; Deliquescence
Categories
Funding
- Netherlands Organisation for Scientific Research (NWO) [13919]
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We have systematically studied the interaction of ultrapure, de-ionized water droplets with chemically amplified, deep-ultraviolet photoresist layers during evaporation by means of experiments. The contact lines of the evaporating droplets undergo two pinning events. The footprint diameters during pinning D-1,D-2 scale with the initial droplet diameter D-0 approximately as D-1,D-2 similar to D-0(4/3). Evaporated droplets leave a residue behind, generally in the form of an ultrathin layer (order 1-10 nm) with a sub-micron thick mound in the center. We have systematically characterized the residue dimensions as a function of the initial droplet size, the photoresist composition and process conditions. Post-evaporation rinsing steps were found to be unable to completely remove a deposit, depending on how long after droplet evaporation they were performed. Our results indicate that the occurrence of so-called watermark defects might be related to deliquescence induced by ionic residues.
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