Journal
ACS NANO
Volume 14, Issue 2, Pages 1645-1655Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsnano.9b06980
Keywords
nanopatterns; CsPbI3 perovskite; phase stabilization; poly(ethylene oxide); nanoimprinting; photodetectors
Categories
Funding
- Creative Materials Discovery Program through the National Research Foundation of Korea (NRF) - Ministry of Science and ICT [2018M3D1A1058536]
- National Research Foundation of Korea (NRF) - Korean government (MEST) [2017R1A2A1A05001160]
- Ministry of Trade, Industry AMP
- Energy (MOTIE, Korea) under the Industrial Technology Innovation Program [10063274]
- Yonsei University [2019-12-0007]
- Korea Evaluation Institute of Industrial Technology (KEIT) [10063274] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Despite the great interest in inorganic halide perovskites (IHPs) for a variety of photoelectronic applications, environmentally robust nanopatterns of IHPs have hardly been developed mainly owing to the uncontrollable rapid crystallization or temperature and humidity sensitive polymorphs. Herein, we present a facile route for fabricating environment-and phase-stable IHP nanopatterns over large areas. Our method is based on nanoimprinting of a soft and moldable IHP adduct. A small amount of poly(ethylene oxide) was added to an IHP precursor solution to fabricate a spin-coated film that is soft and moldable in an amorphous adduct state. Subsequently, a topographically prepatterned elastomeric mold was used to nanoimprint the film to develop well-defined IHP nanopatterns of CsPbBr3 and CsPbI3 of 200 nm in width over a large area. To ensure environment- and phase-stable black CsPbI3 nanopatterns, a polymer backfilling process was employed on a nanopatterned CsPbI3. The CsPbI3 nanopatterns were overcoated with a thin poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) film, followed by thermal melting of PVDF-TrFE, which formed the air-exposed CsPbI3 nanopatterns laterally confined with PVDF-TrFE. Our polymer backfilled CsPbI3 nanopatterns exhibited excellent environmental stability over one year at ambient conditions and for 10 h at 85 degrees C, allowing the development of arrays of two-terminal, parallel-type photodetectors with nanopatterned photoactive CsPbI3 channels. Our polymer-assisted nanoimprinting offers a fast, low-pressure/temperature patterning method for high-quality nanopatterns on various substrates over a large area, overcoming conventional costly time-consuming lithographic techniques.
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