Journal
ACS NANO
Volume 14, Issue 1, Pages 415-421Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsnano.9b06076
Keywords
surfactant; water-borne colloid; organic semiconductor patterning; organic image sensor; organic photodiode
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Funding
- Creative Materials Discovery Program through the National Research Foundation of Korea (NRF) - Ministry of Science and ICT [2019M3D1A2103997]
- Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Science, ICT, and Future Planning [NRF-2018RIA2B6003445]
- National Research Foundation of Korea [2019M3D1A2103997] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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A fully water-based patterning method for polymer semiconductors was developed and utilized to realize high-precision lateral patterning of various polymers. Water-borne polymer colloids, wherein hydrophobic polymers are dispersed in water with the assistance of surfactant molecules, possess a hydrophilic surface when printed onto a substrate. When this surface is exposed to a washing molecule, the surface of the polymer film recovers its original hydrophobic nature. Such surfactant-induced solubility control (SISC) enables environmentally benign, water-processed, and high-precision patterning of various polymer semiconductors with totally different solubilities, so that fully water-processed polymer organic image sensors (OISs) can be realized. B-/G-/R-selective photodiodes with a pixel size of 100 mu m X 100 mu m were fabricated and patterned by this water-based SISC method, leading to not only high average specific detectivity values (over 10(12) Jones) but also narrow pixel-to-pixel deviation. Thanks to the superiority of the SISC method, we demonstrate the image capturing ability of OISs without B-/G-/R-color filters, from a fully water-based fabrication process.
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