4.7 Article

Ferroelectric properties of ion-irradiated bismuth ferrite layers grown via molecular-beam epitaxy

Journal

APL MATERIALS
Volume 7, Issue 11, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.5125809

Keywords

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Funding

  1. Semiconductor Research Corporation (SRC) as nCORE [task 2758.003]
  2. NSF under the E2CDA programs [ECCS-1740136]
  3. U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division [DE-AC02-05-CH11231]
  4. National Science Foundation [DMR-1708615]
  5. NSF MRSEC program [DMR1719875]
  6. NSF [ECCS-1542081]

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We systematically investigate the role of defects, introduced by varying synthesis conditions and by carrying out ion irradiation treatments, on the structural and ferroelectric properties of commensurately strained bismuth ferrite BixFe2-xO3 layers grown on SrRuO3-coated DyScO3(110)(o) substrates using adsorption-controlled ozone molecular-beam epitaxy. Our findings highlight ion irradiation as an effective approach for reducing through-layer electrical leakage, a necessary condition for the development of reliable ferroelectrics-based electronics. (C) 2019 Author(s).

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