Journal
ADVANCED OPTICAL MATERIALS
Volume 7, Issue 24, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adom.201901162
Keywords
large-area devices; metasurfaces; strong absorption; ultrabroadband absorption; unpolarized light
Categories
Funding
- National Natural Science Foundation of China (NSFC) [61575132, 61107016, 61575135, 61505131]
- NFSC Major Research Program on Nanomanufacturing [91323303]
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Large-area, ultrathin devices with strong ultrabroadband absorption and high angular tolerance are in demand for applications such as ultraviolet protection, energy harvesting, photodetectors, and thermal imaging technology. Although there have been considerable efforts to design and fabricate these devices, the simultaneous realization of all desired properties has not been achieved. A 330 nm thick metasurface with an area of 3 cm(2) is experimentally developed, which incorporates dielectric cylinder arrays, a titanium nitride (TiN) layer, and silicon nitride (SiNx) layers. The developed metasurface absorbs approximate to 87% of ultrabroadband light in the range of 250-2250 nm, which covers almost the entire solar spectrum, and has a low hemispherical thermal emittance of approximate to 29% in the long-infrared range (5-13 mu m). Moreover, the structure exhibits strong ultrabroadband absorption over a wide range of incident angles (82% at 60 degrees). In addition, due to the high temperature resistance of TiN and its excellent spectral and angular performance, the device made from this material is ideal for solar-thermal applications.
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