Band alignment and band bending at α-Ga2O3/ZnO n-n isotype hetero-interface

Understanding the electronic structures at the interfaces of wide bandgap oxide heterostructures is crucial for the rational design of oxide-based optoelectronic devices with novel functionality and improved performance. In this work, the electronic band diagram at a ZnO/alpha-Ga2O3 n-n isotype heterojunction is investigated by depth-profile x-ray photoemission spectroscopy (XPS). The directly measured valence-band offset is -0.61 +/- 0.1 eV and a type-I (straddling gap) band alignment is formed at the ZnO/alpha-Ga2O3 heterointerface. As probed by the depth profile of core-levels and VB-XPS, the formation of an interfacial layer is observed due to Ga and Zn interdiffusion, where charged interfacial states result in the downward and upward band-bending at the ZnO and alpha-Ga2O3 sides, respectively. The influence of band bending and band discontinuity at the interface is confirmed by the rectifying characteristics in the Au/alpha-Ga2O3/ZnO heterojunction with electron accumulation at its interface. Taking the thermionic-field emission and band-to-band tunneling mechanisms into account, the simulated transport properties agrees well with the reported I-V characteristics of Au/alpha-Ga2O3/ZnO avalanche photodiode, a further validation of the deduced band alignment of the heterostructure. Published under license by AIP Publishing.