4.6 Article

Understanding the p-Type GaN Nanocrystals on InGaN Nanowire Heterostructures

Journal

ACS PHOTONICS
Volume 6, Issue 10, Pages 2397-2404

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsphotonics.9b01035

Keywords

nanowire; p-GaN; InGaN; light-emitting diode; molecular beam epitaxy

Funding

  1. National Research Foundation of Korea (NRF) - Korea government (MSIP) [2018018638, 201SR1A4A1042417, 2018R1D1A1B07050804]
  2. National Research Foundation of Korea [2018R1D1A1B07050804] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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The efficiency of semiconductor light-emitting diodes (LEDs) has been largely limited by the extremely inefficient p-type conduction on InGaN heterostructures. Here we report highly efficient p-type GaN nanocrystals fabricated by p-i-n nanowire heterostructures using selective area epitaxial growth (SAG). With the different Mg-doping growth conditions in the p-GaN nanostructure, different structure formations and various Mg incorporations were confirmed by detailed scanning electron microscopy and cathodoluminescence analysis. The growth mechanism of p-GaN nanocrystal formation on nanowire structures was also suggested by CL mapping measurements. Single nanowire LEDs exhibited different current voltage behaviors from various p-GaN nanocrystal formations. The resulting p-contacted InGaN/GaN nanowire LEDs showed a low turn-on voltage (similar to 2.3 V), reduced resistance, and enhanced electroluminescence intensity at 532 nm wavelength, which is very important for realizing high-efficiency InGaN LEDs operating in the green and red wavelength ranges. This demonstration provides important insight into the fundamental formation characteristics of p-GaN nanocrystals on the nanowire heterostructure and also offers a viable path for realizing multifunctional nanoscale photonic and electronic devices.

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