Journal
MICROMACHINES
Volume 10, Issue 8, Pages -Publisher
MDPI
DOI: 10.3390/mi10080552
Keywords
silicon oxynitride; thin film; photoluminescence; chemical vapor deposition; physical vapor deposition
Categories
Funding
- Beijing Municipal Science and Technology Commission [Z181100004418004]
- National Natural Science Foundation of China [61501039]
- Beijing Natural Science Foundation [2162017]
- Research and Development Program of Beijing Institute of Graphic Communication [Ec201808, Ea201803]
- Programme of Key Technologies of Thin Film Printing Electronics [04190118002/042]
- Programme of Flexible Printed Electronic Materials and Technology Innovation [04190118002/092]
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Silicon oxynitride (SiNxOy) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings. This review presents recent developments, and discusses the preparation methods, performance, and applications of SiNxOy film. In particular, the preparation of SiNxOy film by chemical vapor deposition, physical vapor deposition, and oxynitridation is elaborated in details.
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