Journal
ADVANCED OPTICAL MATERIALS
Volume 7, Issue 22, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adom.201901040
Keywords
diffusion-reaction equations; polymerization kinetics; Schwarzschild effect; two-photon polymerization
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Funding
- Helmholtz program Science and Technology of Nanosystems (STN)
- Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) under Germany's Excellence Strategy via the Excellence Cluster 3D Matter Made to Order [EXC-2082, 390761711]
- Carl Zeiss Foundation through the Carl-Zeiss-Focus@HEiKA
- Australian Research Council (ARC)
- Queensland University of Technology (QUT)
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The two-photon Schwarzschild effect in photoresists suitable for 3D laser lithography is revisited. The study ranges over seven orders of magnitude in exposure time (from 1 mu s to 10 s) and investigates a wide variety of different photoresist compositions. For short exposure times (regime I), the laser power at the polymerization threshold can scale with the inverse square root of the exposure time, as naively to be expected for two-photon absorption. Substantial deviations occur, however, for low photoinitiator concentrations. For intermediate exposure times (regime II), a Schwarzschild-type of behavior is found, as discussed previously. For very long exposure times (regime III), an unexpected deviation from regime II is found. By presenting numerical solutions of the coupled 3D reaction-diffusion equations, this behavior is explained in terms of the diffusion of oxygen and photoinitiator molecules, respectively.
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