Journal
MRS COMMUNICATIONS
Volume 9, Issue 3, Pages 916-923Publisher
SPRINGER HEIDELBERG
DOI: 10.1557/mrc.2019.89
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Funding
- Luxembourg National Research Fund (FNR) [INTER/SNF/16/11536628]
- Swiss National Science Foundation (SNF) within the bilateral project NACHOS
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A method for rapid quantitative imaging of dopant distribution using secondary ion mass spectrometry (SIMS) is described. The method is based on SIMS imaging of the cross-section of a reference sample with a known concentration profile. It is demonstrated for the case of boron quantification in silicon in a SIMS imaging mode. A nonlinear relationship between the secondary ion intensity and the concentration is observed. A detection limit of 3 (+/- 2) x 10(17) at./cm(3) (similar to 6 ppm) is determined with 39 nm pixel-size for the used experimental conditions. As an application example, a boron concentration profile in a passivating contact deposited on a textured Si surface is analyzed.
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