Journal
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
Volume 217, Issue 3, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssa.201900630
Keywords
chemical etching; dislocations; synchrotron X-ray topography; beta-Ga2O3
Funding
- JSPS KAKENHI [JP16K17516, 2016G567, 2018G501]
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Chemical etching and synchrotron X-ray topography (XRT) are used to reveal dislocations in commercial edge-defined film-fed growth (EFG) beta-Ga2O3 substrates with the (010)-oriented or the (-201)-oriented surface. Different etchants and etching temperatures are compared, and the optimal condition is found to be etching in a eutectic KOH + NaOH solution at 200 degrees C for 2 min. By counting the surface features formed by etching, dislocation density is estimated to be in the range of 6 x 10(4)-1 x 10(6) cm(-2), viewed from the (010) surface, and 8 x 10(4 )cm(-2), viewed from the (-201) surface. A comparison of dislocation contrast observed by XRT and etch pits has confirmed that the above chemical etching is capable of revealing dislocations accurately.
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