Journal
CERAMICS INTERNATIONAL
Volume 45, Issue 18, Pages 24324-24330Publisher
ELSEVIER SCI LTD
DOI: 10.1016/j.ceramint.2019.08.147
Keywords
ZnO thin films; N-doping; Pulsed spray pyrolysis; E-traps; p-type conductivity
Categories
Funding
- Central Instrumentation Facility (CIF), Pondicherry University
- MNRE (NREF), INDIA
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The N-doped ZnO thin films have been deposited using pulsed spray pyrolysis from Zinc Acetate (ZA) precursor along with the N dopants of N-2 carrier gas (N2 - series) and Ammonium Acetate (AA - series) on glass substrates at the optimized substrate temperature of 300 degrees C with different spraying pulse intervals. The X-ray powder diffraction studies confirmed the polycrystalline structures with the presence of mixed compressive and tensile strain along 'a' and 'c-axes' respectively for the N-2 doped films and the presence of compressive strain alone along both 'a' and 'c-axes' for the AA doped films. The XPS analysis revealed that the N-2 gas source led to the incorporation of elemental N into the film and the AA source led to the incorporation of both elemental and molecular N into the film. The Micro Raman Analysis confirmed the N-doping and its contributed carrier localization by exhibiting A(1)(LO) and A(1)(TO) modes. Photoluminescence studies exhibited the active band gap of similar to 3.19 eV with additional peaks related to hole traps at similar to 3 eV and electron traps at similar to 2.8 eV without exhibiting peaks correspond to oxygen vacancy defects. The Seebeck measurements confirmed the establishment of intrinsic p-type conductivity in both the cases at room temperature (RT) and the films deposited with pure elemental doping from N-2 source found exhibiting better p-type conductivity than those films deposited using AA source.
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