Journal
APL MATERIALS
Volume 7, Issue 6, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.5094586
Keywords
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Funding
- National Research Foundation of Korea [2018R1A2B2003558, 2015R1A1A1A05027488, 2016R1A2B4014369]
- GRRC program of Gyeonggi province [GRRC Sungkyunkwan 2017-B06]
- National Research Foundation of Korea [2018R1A2B2003558] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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We report the enhanced photoresponse in MoS2-MoOx heterojunction thin film structures on SiO2/Si substrates to demonstrate the feasibility of using them as highly responsive photodetectors with a wide spectral range from visible to near-ultraviolet light. Vertically stacked MoS2-MoOx heterojunction structures were obtained through two-step chemical vapor deposition composed of MoOx thin film deposition and subsequent sulfurization of the topmost region of as-deposited MoOx into MoS2. The formation of heterojunction structures was revealed by transmission electron microscopy and x-ray photoelectron spectroscopy analysis. Under an incident light of 405 nm and 638 nm in wavelength, our MoS2-MoOx heterojunction thin film structures exhibited significantly higher absorbance, photoresponsivity, and specific detectivity than MoOx thin films. Moreover, a highly uniform photoresponse was obtained throughout heterojunction thin film structures. These results demonstrate that MoS2-MoOx heterojunction thin film structures can be a potentially promising material system scalable into large-area photodiode arrays to build active-matrix high-energy-selective photodetectors.
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