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APPLIED PHYSICS LETTERS (2005)
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IEEE TRANSACTIONS ON PLASMA SCIENCE (2005)
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Low-temperature deposition of aluminum oxide by radical enhanced atomic layer deposition
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Atomic layer deposition of ruthenium thin films for copper glue layer
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Study of oxygen atom recombination on a Pyrex surface at different wall temperatures by means of time-resolved actinometry in a double pulse discharge technique
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Atomic-layer deposition of wear-resistant coatings for microelectromechanical devices
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