Journal
MICROMACHINES
Volume 10, Issue 6, Pages -Publisher
MDPI
DOI: 10.3390/mi10060401
Keywords
laser direct writing; femtosecond laser; glyoxylic acid Cu complex; reduction; Cu micropattern
Categories
Funding
- Nano-Technology Platform Program (Micro-NanoFabrication)
- Leading Initiative for Excellent Young Researchers of the Ministry of Education, Culture, Sports, Science and Technology, Japan (MEXT)
- JSPS KAKENHI [JP16H06064]
- 10th Shiseido Female Researcher Science Grant
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We have fabricated Cu-based micropatterns in an ambient environment using femtosecond laser direct writing to reduce a glyoxylic acid Cu complex spin-coated onto a glass substrate. To do this, we scanned a train of focused femtosecond laser pulses over the complex film in air, following which the non-irradiated complex was removed by rinsing the substrates with ethanol. A minimum line width of 6.1 mu m was obtained at a laser-pulse energy of 0.156 nJ and scanning speeds of 500 and 1000 mu m/s. This line width is significantly smaller than that obtained in previous work using a CO2 laser. In addition, the lines are electrically conducting. However, the minimum resistivity of the line pattern was 2.43 x 10(-6) Omega center dot m, which is similar to 10 times greater than that of the pattern formed using the CO2 laser. An X-ray diffraction analysis suggests that the balance between reduction and re-oxidation of the glyoxylic acid Cu complex determines the nature of the highly reduced Cu patterns in the ambient air.
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