Journal
ACS MACRO LETTERS
Volume 8, Issue 8, Pages 899-904Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsmacrolett.9b00412
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Funding
- Michigan Translational Research and Commercialization (MTRAC) Innovation Hub for Advanced Transportation Kickstart program
- University of Michigan Rackham Graduate Student Research Grant
- PPG Summer Fellowship
- Honor Society of Phi Kappa Phi Project Grant
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Conventional photolithographic rapid prototyping approaches typically achieve reaction confinement in depth through patterned irradiation of a photopolymerizable resin at a wavelength where the resin strongly absorbs, such that only a very thin layer of material is solidified. Consequently, three-dimensional objects are fabricated by progressive, two-dimensional addition of material, curtailing fabrication rates and necessitating the incorporation of support structures to ensure the integrity of overhanging features. Here, we examine butyl nitrite as a UV-active photoinhibitor of blue light-induced photopolymerizations and explore its utilization to confine in depth the region polymerized in a volume of resin. By employing two perpendicular irradiation patterns at blue and near-UV wavelengths to independently effect either polymerization initiation or inhibition, respectively, we enable three-dimensional photopolymerization patterning in bulk resin, thereby complementing emergent approaches to volumetric 3D printing.
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