Journal
PLANT GROWTH REGULATION
Volume 89, Issue 2, Pages 143-152Publisher
SPRINGER
DOI: 10.1007/s10725-019-00518-x
Keywords
Waterlogging stress; Hypoxia mark genes; Chlorophyll fluorescence; MDA
Categories
Funding
- Engineering Research Centre of Ecology and Agricultural Use of Wetland, Ministry of Education of China [KF201605]
- open fund of Hubei Collaborative Innovation Centre for Grain Industry [LXT-16-10]
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Waterlogging hampers plants growth and development, and its detrimental effects are strongly influenced by environmental factors. One of these factors is an ambient temperature. In this work, we showed that damage caused by waterlogging stress to Arabidopsis thaliana was less severe at lower temperatures than that at higher temperatures. The leaf photochemistry characteristics (chlorophyll fluorescence Fv/Fm, YII, ETR, and qP characteristics), chlorophyll content, and leaf temperature were more stable, and plants accumulated less malondialdehyde during waterlogging stress at low temperature (16 degrees C) than at elevated temperature (22 degrees C and/or 28 degrees C). Transcripts of hypoxia-related genes (such as ADH1, SUS1, PDC1, RAP2.3 and HRE1/2) were less induced after waterlogging treatment under higher temperature compared to lower temperature at early time points (3 h or 6 h) while they showed a conversed trend at later time points. Thus, we conclude that temperature may affect Arabidopsis waterlogging tolerance through the regulation of expression of hypoxia marker genes, photosynthesis, leaf transpirational cooling, and MDA accumulation.
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