4.7 Article

Hierarchical fabrication Z-scheme photocatalyst of BiVO4 (040)-Ag@CdS for enhanced photocatalytic properties under simulated sunlight irradiation

Journal

JOURNAL OF COLLOID AND INTERFACE SCIENCE
Volume 548, Issue -, Pages 293-302

Publisher

ACADEMIC PRESS INC ELSEVIER SCIENCE
DOI: 10.1016/j.jcis.2019.04.043

Keywords

Z-scheme; BiVO4 (040)-Ag@CdS; Facet effect; H2O2; Photodegradation

Funding

  1. National Natural Science Foundation of China [21868034]
  2. International Science and Technology Cooperation Program of Shihezi University [GJHZ201601]
  3. Xi'an Science and Technology Project of China [201805030YD8CG14]

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Interfacial charge separation and heterojunction system are conductive to improving its photocatalytic performance. Herein, we designed a novel photocatalyst of Z-scheme BiVO4 (0 4 0)-Ag@CdS, in which Ag was photo-deposition on the (0 4 0) facets of BiVO4 as the linker between BiVO4 and CdS. Characterizations of XRD and SEM clearly revealed that the BiVO4 (0 4 0)-Ag@CdS was prepared through hierarchical fabrication. The photoelectrochemical performances demonstrated BiVO4 with high proportion (0 4 0) facet and CdS with nanorods structure could drastically improve the photocatalytic performance. Then, the 100%BiVO4 (0 4 0)-Ag@CdS presented an excellent photodegradation rate towards tetracycline hydrochloride, which is 8.67 times than that of single BiVO4. In addition, the results of light assisted Fenton-like oxidation revealed that the 100%BiVO4 (0 4 0)-Ag@CdS performed the highest photodegradation rate towards 2, 4-dichlorophenoxyacetic acid with the assist of 12 mM H2O2 under the irradiation of simulated sunlight, and the photodegradation pathway was analyzed through GC-MS. This contribution provides a novel insight for improving the separation efficiency of photoelectron hole pair and photodegradate towards refractory organic pollutants. (C) 2019 Elsevier Inc. All rights reserved.

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