Journal
APPLIED PHYSICS LETTERS
Volume 108, Issue 13, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.4945327
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Ferroelectric field-effect transistors (FeFET) based on MoS2 have recently been shown to exhibit considerable potential for use in nano sized non-volatile memory devices. Here, we demonstrated fabrication and characterization of FeFET based on MoS2 channel with vinylidene fluoride (VDF)trifluoroethylene (TrFE) copolymer as back-gate insulator. In this device, counterclockwise hysteresis behavior was observed in the drain current-gate voltage curve, which is indicative of interaction between MoS2 carrier modulation and ferroelectric polarization switching. Furthermore, our VDFTrFE/ MoS2 FeFET exhibited only n-type behavior, a maximum linear mobility of 625 cm(2)/Vs, a large memory window width of 16 V, and a high on/off current ratio of 8 x 10(5). (C) 2016 AIP Publishing LLC.
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