4.5 Review

Chemical vapour deposition of graphene: layer control, the transfer process, characterisation, and related applications

Journal

INTERNATIONAL REVIEWS IN PHYSICAL CHEMISTRY
Volume 38, Issue 2, Pages 149-199

Publisher

TAYLOR & FRANCIS LTD
DOI: 10.1080/0144235X.2019.1634319

Keywords

Graphene; chemical vapour deposition; characterisation; growth mechanism; transfer process; applications

Funding

  1. Fonds de Recherche du Quebec-Nature et Technologies (FRQNT)
  2. Natural Sciences and Engineering Research Council of Canada (NSERC)
  3. Institut National de la Recherche Scientifique (INRS)
  4. Centre Quebecois sur les Materiaux Fonctionnels (CQMF)
  5. China Scholarship Council (CSC)
  6. ECS Toyota Young Investigator Fellowship
  7. Shastri Indo-Canadian Institute (SICI)
  8. FRQNT

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Graphene, one of the most promising two-dimensional (2D) nanomaterials, has gained substantial attention in several areas of materials science. Due to its unique mechanical, electrical, optical, and thermal properties, graphene-based materials have triggered both numerous fundamental studies and technological applications. Out of several synthetic methods, chemical vapour deposition (CVD) has emerged as one of the most promising methods for the production of large areas of high quality single-crystal graphene. This review introduces the fundamental growth mechanisms of CVD graphene, alongside the various parameters and substrates employed in this process. Furthermore, new developments in the CVD synthesis of monolayer and few-layer graphene are presented, as well as advanced techniques for analysing the fine structure and properties of graphene. Moreover, a detailed discussion of the transfer processes used for practical applications of CVD graphene is provided, with emphasis on their fundamental aspects. This review concludes with an outlook on presently challenging issues, prospects and applications of graphene.

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