Synthesis and characterization of g/Ni-SiO2 composite for enhanced hydrogen storage applications

Hydrogen is considered as one of the most important clean energy carriers for the future. Many experimental and theoretical investigations have focused on the adsorption and activation of H-2 on the metal surfaces. Metal oxides and semiconductors are suitable materials for this purpose. Gelatin assisted Ni loaded SiO2 (g/Ni-SiO2) was prepared and its structural properties, morphology, composition and surface properties were analyzed by X-ray diffraction (XRD), Fourier-transform infrared spectroscopy (FT-IR), Field emission scanning electron microscopy (FE-SEM), Elemental mapping and energy dispersive spectrum (EDS), High resolution transmission electron microscopy (HR-TEM) and Brunauer-Emmett-Teller (BET) surface area measurements. The prepared material was effectively utilized for H-2 storage applications at room temperature. The H-2 storage capacity of g/Ni-SiO2 was twice that of pristine SiO2. This may be due to large change in pore volume and pore diameter of g/Ni-SiO2, which may enhances the H-2 storage capacity of the sample. The H-2 storage capacity of other materials such as ZnO, anatase TiO2, g/TiO2, g/ZnO, g/TiO2-SO42-,Sb doped TiO2, Ag2S/TiO2, Sb2O3, CdS and SiO2/CdS also studied and compared with g-Ni/SiO2. (C) 2019 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.