Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 11, Issue 31, Pages 28164-28171Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsami.9b07634
Keywords
focused electron beam induced deposition; ruthenium; precursor compounds; mask repair; post-growth purification
Funding
- EU Horizon 2020 Marie Curie-Sklodowska Innovative Training Network ELENA [722149]
- US National Science Foundation [CHE-1607547]
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Focused electron beam-induced deposition using the heteroleptic complex (eta(3)-C3H5)Ru(CO)(3)Br as a precursor resulted in deposition of material with Ru content of 23 at. %. Transmission electron microscopy images indicated a nanogranular structure of pure Ru nanocrystals, embedded into a matrix containing carbon, oxygen, and bromine. The deposits were purified by annealing in a reactive 98% N-2/2% H-2 atmosphere at 300 degrees C, resulting in a reduction of contaminants and an increase of the Ru content to 83 at. %. Although a significant volume loss of 79% was found, the shrinkage was observed mostly for vertical thickness (around 75%). The lateral dimensions decreased much less significantly (around 9%). Deposition results, in conjunction with previous gasphase and condensed-phase surface studies on the electron-induced reactions of (eta(3)-C3H5)Ru(CO)(3)Br, provide insights into the behavior of allyl, carbonyl, and bromide ligands under identical electron beam irradiation.
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