Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 193, Issue -, Pages 231-236Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.solmat.2019.01.019
Keywords
Black flexible silicon; Aluminum oxynitride; Surface passivation; Thermal atomic layer deposition; Time-of-flight elastic recoil detection analysis (ToF-ERDA)
Funding
- India-European Union 'New INDIGO' research from Department of Science and Technology, Govt. of India [RP02949]
- Academy of Finland [283011]
- MNRE, Govt. of India
- Academy of Finland (AKA) [283011, 283011] Funding Source: Academy of Finland (AKA)
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Aluminum oxynitride (AlOxNy) films with different nitrogen concentration are prepared by thermal atomic layer deposition (ALD) for flexible nano-textured silicon (NT-Si) surface passivation. The AlOxNy films are shown to exhibit a homogeneous nitrogen-doping profile and the presence of an adequate amount of hydrogen, which is investigated by Time-of-Fight Elastic Recoil Detection Analysis (ToF-ERDA). The effective minority carrier lifetimes are measured after the NT-Si surface passivation; the minimum surface recombination velocity (SRV) of 5 cm-s(-1) is achieved with the AlOxNy film in comparison to the Al2O3 and AlN films (SRV of 7-9 cm-s(-1)). The better SRV with AlOxNy film is due to the collective effect of field-effect passivation by the presence of fixed negative charges, and chemical passivation by the presence of hydrogen within the film. The capacitance-voltage, and conductance measurements also are carried out using metal-oxide-semiconductor structure to determine the fixed negative charge density (N-i,N-ox), and defect density of states (D-it) in the AlOxNy films. The better surface passivation is attributed to unusually large N-i,N-ox of similar to 6.07 x 10(12) cm(-2), and minimal D-it of similar to 1.01 x 10(11) cm(-2)-eV(-1) owing to the saturation of Si dangling bonds by the hydrogen within the AlOxNy film matrix after the annealing step.
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