Journal
PLASMA PROCESSES AND POLYMERS
Volume 16, Issue 7, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/ppap.201900024
Keywords
deposition characterization; infrared spectroscopy; organosilicon precursors; plasma polymerization; plasma-enhanced chemical vapor deposition
Funding
- Shin-Etsu Chemical Company, Ltd.
- Division of Materials Research [DMR-1429267]
- National Science Foundation Major Research Instrumentation Program
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The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy-deficient and monomer-deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier-transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius-type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si-O-Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input. [GRAPHICS] .
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