Journal
MATERIALS TRANSACTIONS
Volume 60, Issue 5, Pages 693-697Publisher
JAPAN INST METALS & MATERIALS
DOI: 10.2320/matertrans.MC201805
Keywords
NiTi; shape memory alloy; glow discharge deposition; titanium nitride; titanium oxide; multi-layer cover
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A thin layer, about 25 nm thick, was produced in glow discharge deposition process on the surface of the NiTi shape memory alloy. Structural and chemical studies revealed that the layer consisted of two sublayers. About 7 nm thick one, adhering closely to the NiTi substrate and formed from the nanocrystalline titanium nitride was followed by 17 nm of the amorphous titanium oxide layer. The technological parameters of the glow discharge process caused that the presence of the R-phase in the matrix was identified.
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