Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 66, Issue 5, Pages 2346-2352Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2019.2901658
Keywords
Carbon nanotube (CNT); CNT contact resistance; defective CNTs; doped CNTs; doping process of CNT; individual CNT growth; local on-chip interconnects
Funding
- European Commission H2020 CONNECT Project through the Research and Innovation Program [688612]
- Intel Oregon
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In this paper, we investigate, by combining electrical measurements with an atomistic-to-circuit modeling approach, the conductance of doped standalone multiwall carbon nanotubes (CNTs) as a viable candidate for the next generation of back-end-of-line interconnects. Ab initio simulations predict a doping-related shift of the Fermi level, which reduces shell chirality variability and improves electrical resistivity up to 90% by converting semiconducting shells to metallic. Electrical measurements of Pt-salt-doped CNTs provide up to 50% of resistance reduction, which is a milestone result for future CNT interconnect technology. Moreover, we find that defects and contacts introduce additional resistance, which limits the efficiency of doping, and are the primary cause for the mismatch between theoretical predictions and experimental measurements on doped CNTs.
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