4.8 Article

Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching

Journal

CHEMISTRY OF MATERIALS
Volume 31, Issue 11, Pages 3878-3882

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.chemmater.9b00193

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Funding

  1. Netherlands Organization for Scientific Research (NWO) through the Zwaartekracht program Research Centre for Integrated Nanophotonics
  2. NASCENT Whaley fellowship
  3. Solliance
  4. Dutch province of Noord-Brabant
  5. National Science Foundation (NSF) Graduate Research Opportunities Worldwide program

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