Journal
JOURNAL OF ADVANCED CERAMICS
Volume 8, Issue 1, Pages 148-152Publisher
SPRINGER
DOI: 10.1007/s40145-019-0319-3
Keywords
high-entropy ceramics; high-entropy silicide; spark plasma sintering; silicide
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Funding
- National Natural Science Foundation of China [51532009, 51872045]
- Science and Technology Commission of Shanghai Municipality [18ZR1401400]
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A high-entropy silicide (HES), (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si-2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 degrees C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive spectrometer analysis except a small amount of zirconium that is combined with oxygen as impurity particles. The Young's modulus, Poisson's ratio, and Vickers hardness of the obtained (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si-2 are also measured.
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