4.6 Article

Alternative stacking sequences in hexagonal boron nitride

Journal

2D MATERIALS
Volume 6, Issue 2, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/2053-1583/ab0e24

Keywords

hexagonal boron nitride; 2D materials; bernal stacking; density functional theory; transmission electron microscopy; chemical vapor deposition

Funding

  1. Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division, of the US Department of Energy [DE-AC02-05-CH11231, KC-2207]
  2. National Science Foundation [DMR-1206512, 1542741, DMR 1508412]
  3. Office of Science, Office of Basic Energy Sciences, of the US Department of Energy [DE-AC02-05CH11231]
  4. Kavli Energy Nano Sciences Institute Fellowship
  5. NSF Graduate Fellowship
  6. van der Waals Heterostructures program [KCWF16]

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The relative orientation of successive sheets, i.e. the stacking sequence, in layered 2D materials is central to the electronic, thermal, and mechanical properties of the material. Often different stacking sequences have comparable cohesive energy, leading to alternative stable crystal structures. Here we theoretically and experimentally explore different stacking sequences in the van der Waals bonded material hexagonal boron nitride (h-BN). We examine the total energy, electronic bandgap, and dielectric response tensor for five distinct high symmetry stacking sequences for both bulk and bilayer forms of h-BN. Two sequences, the generally assumed AA' sequence and the relatively unknown (for h-BN) AB (Bernal) sequence, are predicted to have comparably low energy. We present a scalable modified chemical vapor deposition method that produces large flakes of virtually pure AB stacked h-BN; this new material complements the generally available AA' stacked h-BN.

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