4.4 Article

O-band InAs/GaAs quantum-dot microcavity laser on Si (001) hollow substrate by in-situ hybrid epitaxy

Journal

AIP ADVANCES
Volume 9, Issue 1, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.5065527

Keywords

-

Funding

  1. National Natural Science Foundation of China [11504415, 11434010, 11574356, 61635011]
  2. National Key Research and Development Program of China [2016YFA0300600, 2016YFA0301700, 2015CB932400]
  3. Key Research Program of Frontier Sciences, CAS [QYZDB-SSW-JSC009]
  4. Youth Innovation Promotion Association of CAS [2018011]
  5. EPSRC [EP/J012904/1] Funding Source: UKRI

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Recent years, the emergence of hyper-scale data centers boosted the research field of integrated silicon photonics. One of the major challenges for compact photonic integrated circuits is silicon based lasers. In this paper, we demonstrate optically pumped InAs/GaAs quantum-dot micropillar laser on exact Si (001) by (111)-faceted-sawtooth Si hollow structure via IV/III-V hybrid epitaxy. The lasing threshold of InAs/GaAs quantum- dot micropillar is as low as 20 mu W with the pillar diameter of 15 mu m. Moreover, the micropillar laser is capable of operating at maximum temperature up to 100 degrees C. (C) 2019 Author(s).

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