Journal
OPTICAL MATERIALS EXPRESS
Volume 9, Issue 3, Pages 1200-1207Publisher
OPTICAL SOC AMER
DOI: 10.1364/OME.9.001200
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Funding
- National Science Foundation [NSF-ECCS-1428069, NSF-ECCS-1644731]
- University of Michigan [UM-041227]
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In this work, high performance subwavelength grating metalens is demonstrated with high-refractive-index silicon-rich silicon nitride material compatible with CMOS fabrication processes. Conventional metalens materials namely TiO2 and GaN require expensive and time-consuming deposition processes such as atomic layer deposition (ALD) and metal-organic chemical vapor deposition (MOCVD). In order to improve the cost efficiency of metalens and its performance, the trade-offs between refractive index, fabrication difficulty and metalens performance is studied. We propose a feasible approach that is silicon-rich nitride (SiNx) as metalens material, which balance the trade-offs between refractive index and fabrication difficulty to large extent. With the advantage of ultra-high refractive index SiNx (n = 2.74) at 685 nm incidence, we are able to shrink the pitch size to unprecedented 220 nm. A propagation-phase-based grating metalens is fabricated and characterized for proof of concept. In addition, the optical parameters (n & k) can easily be adjusted through the deposition process. Our work has also promised a new degree of freedom for future optimization of metalens. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
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