Materials processing using radio-frequency ion-sources: Ion-beam sputter-deposition and surface treatment

The capabilities of ion-beam techniques for thin-film processing, i.e., for materials deposition by ion-beam sputtering and surface treatment, are reviewed. The basic interaction mechanisms between ions and solids are summarized and related to materials processing by ion sources. Typical geometries of ion sources, targets, and samples are discussed for corresponding experimental apparatus. The versatility of ion-beam techniques in the preparation of thin films and multilayer structures is illustrated by several examples: ion-beam sputter-deposition of various binary oxide materials (including crystalline MgO, NiO, ZnO, SnxOy, and CuxOy) as well as combinatorial growth of materials libraries of amorphous ternary oxides. Furthermore, controlled ion-beam etching of surfaces is discussed. Published under license by AIP Publishing.