Journal
NANOSCALE RESEARCH LETTERS
Volume 14, Issue -, Pages -Publisher
SPRINGEROPEN
DOI: 10.1186/s11671-019-2868-3
Keywords
All-Si photodetector; Internal emission of hot electrons; Surface plasmonic resonator; Polarimetric detection; Nanofabrication
Funding
- Fudan University-CIOMP Joint Fund [FC2017-008]
- National Natural Science Foundation of China [61574043, U1732104]
- Basic Research Project of Shanghai Science and Technology Innovation Action [17JC1400300]
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This work developed an all-Si photodetector with a surface plasmonic resonator formed by a sub-wavelength Au grating on the top of a Si-nanowire array and the same one beside the wires. The Au/Si interface with a Schottky barrier allows the photo-electron detection in near-infrared wavelength based on the internal emission of hot electrons generated by the surface plasmons in the cavity. Meanwhile, the Au sub-wavelength grating on the Si nanowire array acts as a polarizer for polarimetric detection. Finite-difference time-domain method was applied in the design of the novel device and state-of-art nanofabrication based on electron beam lithography was carried out. The characterization of the photo-electronic properties as well as the polarimetric detection demonstrate that the fabricated detectors on the silicon substrate possesses great prospects for sensing technology on all-Si.
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