4.3 Article

Atomic Layer Deposited Hf0.5Zr0.5O2-based Flexible Memristor with Short/Long-Term Synaptic Plasticity

Journal

NANOSCALE RESEARCH LETTERS
Volume 14, Issue -, Pages -

Publisher

SPRINGEROPEN
DOI: 10.1186/s11671-019-2933-y

Keywords

Atomic layer deposition; Low-temperature process; Flexible electronics; Synaptic plasticity

Funding

  1. NSFC [61704030, 61522404]
  2. 02 State Key Project [2017ZX02315005]
  3. Program of Shanghai Subject Chief Scientist [18XD1402800]
  4. Support Plans for the Youth Top-Notch Talents of China
  5. Chen Guang project - Shanghai Municipal Education Commission
  6. Shanghai Education Development Foundation

Ask authors/readers for more resources

Artificial synapses are the fundamental of building a neuron network for neuromorphic computing to overcome the bottleneck of the von Neumann system. Based on a low-temperature atomic layer deposition process, a flexible electrical synapse was proposed and showed bipolar resistive switching characteristics. With the formation and rupture of ions conductive filaments path, the conductance was modulated gradually. Under a series of pre-synaptic spikes, the device successfully emulated remarkable short-term plasticity, long-term plasticity, and forgetting behaviors. Therefore, memory and learning ability were integrated to the single flexible memristor, which are promising for the next-generation of artificial neuromorphic computing systems.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.3
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available