4.8 Article

Laser Writing of Scalable Single Color Centers in Silicon Carbide

Journal

NANO LETTERS
Volume 19, Issue 4, Pages 2377-2383

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.8b05070

Keywords

Silicon vacancy defect; silicon carbide; arrays; laser writing; scalable

Funding

  1. Baden-Wurttemberg Stiftung Program: Internationale Spitzenforschung
  2. ERC SMel
  3. BMBF BRAINQSENS
  4. EPSRC [EP/R004803/1] Funding Source: UKRI

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Single photon emitters in silicon carbide (SiC) are attracting attention as quantum photonic systems (Awschalom et al. Nat. Photonics 2018, 12, 516-527; Atatiire et al. Nat. Rev. Mater. 2018, 3, 38-51). However, to achieve scalable devices, it is essential to generate single photon emitters at desired locations on demand. Here we report the controlled creation of single silicon vacancy (V-Si) centers in 4H-SiC using laser writing without any postannealing process. Due to the aberration correction in the writing apparatus and the nonannealing process, we generate single V-Si centers with yields up to 30%, located within about 80 nm of the desired position in the transverse plane. We also investigated the photophysics of the laser writing V-Si centers and concluded that there are about 16 photons involved in the laser writing V-Si center process. Our results represent a powerful tool in the fabrication of single V-Si centers in SiC for quantum technologies and provide further insights into laser writing defects in dielectric materials.

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