Journal
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS
Volume 241, Issue -, Pages 9-12Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mseb.2019.02.004
Keywords
Cobalt; Electroless deposition; Amines; EQCM
Funding
- Research Council of Lithuania [LAT-12/2016]
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Electroless deposition (also called chemical deposition) is a commonly used chemical approach to prepare metallic layers on various substrates. Cobalt films were deposited on the copper electrode using dimethylamine borane (DMAB) as a reducing agent and different amines: diethylenetriamine (dien), triethylenetetraamine (trien), propylenediamine (prop), tetraethylenepentaamine (ttren), pentaethylenehexaamine (pnten). The deposition conditions of electroless deposition of cobalt films were investigated in more detail by means of electrochemical quartz crystal microgravimetry (EQCM). The effects of pH, temperature and concentration of the reactants on the deposition rate of cobalt films have been determined. It was found that the induction period of the deposition of cobalt films depends on solution composition, temperature, and the presence of different amines.
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