4.4 Article Proceedings Paper

Effect of growth rate on morphology evolution of 4H-SiC thick homoepitaxial layers

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 507, Issue -, Pages 143-145

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2018.10.040

Keywords

Surfaces; Chemical vapor deposition processes; Semiconducting materials; Semiconducting silicon compounds

Funding

  1. National Key Research and Development Program of China [2016YFB0400500]

Ask authors/readers for more resources

In this paper, the surface morphologies of 4H-SiC epilayers with different growth rates were investigated by Candela CS920, atomic force microscope and optical microscope. The investigation of the surface morphologies of the samples showed that an evolution from micro-step to small-step and then back to macro-step occurred on the surface, with the surface roughness increased gradually during this evaluation. It was concluded that the higher growth rate the larger differences of step migration rate. In this case, the steps easily gather together forming greater steps. The gathering effect was enhanced with the increase of the growth rate.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available