4.1 Article

Influences of contact electrode shape and incidence direction on p-i-n photodiodes

Journal

IET OPTOELECTRONICS
Volume 13, Issue 4, Pages 151-154

Publisher

INST ENGINEERING TECHNOLOGY-IET
DOI: 10.1049/iet-opt.2018.5037

Keywords

photoconductivity; p-i-n photodiodes; contact electrode shape; incidence direction; p-i-n photodiodes; vertical illumination direction; ring-covered p-contact electrode; FCC-PD; RCC-PD; mesa diameter; fully-covered p-contact electrode; p-side illumination; n-side illumination; output photocurrent; size 40; 0 mum; voltage-3; 0 V; frequency 33; 6 GHz; current 7; 0 mA

Funding

  1. Joint Laboratory of Quantum Optoelectronics and the Theory of Bivergentum
  2. Beijing International Scientific and Technological Cooperation Base of Information Optoelectronics and Nanoheterogeneous Structure
  3. Specialised Research Fund for the Doctoral Program of Higher Education of China [20130005130001]
  4. National Nature and Science Foundation of China (NSFC) [61574019, 61674018, 61674020]
  5. Fund of State Key Laboratory of Information Photonics and Optical Communications

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The influences of contact electrode shape and vertical illumination direction on the performance of p-i-n photodiodes (PDs) are studied by theory and experiment. The PDs with ring-covered p-contact electrode (RCC-PD) and fully-covered p-contact electrode (FCC-PD) were fabricated and tested. For the RCC-PD, the influences of p-side and n-side illumination on the bandwidth also analysed. The results show that for the PDs with 40 mu m mesa diameter under -3 V bias and 7.0 mA output photocurrent, a 40.6 and 31.6% increase of bandwidth and responsivity in the FCC-PD compared with RCC-PD. The 3 dB bandwidth and responsivity of the FCC-PD with a 40 mu m mesa diameter at -3 V bias can reach 33.6 GHz and 0.5 A/W, respectively.

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