Journal
FUNCTIONAL MATERIALS LETTERS
Volume 12, Issue 4, Pages -Publisher
WORLD SCIENTIFIC PUBL CO PTE LTD
DOI: 10.1142/S1793604719500553
Keywords
Hot-wire CVP; silicon nanowires; electrophoretic; reduced graphene oxide
Categories
Ask authors/readers for more resources
The graphene nanosheets have been deposited on silicon nanowires (SiNWs) at room temperature. SiNWs were grown by hot-wire chemical vapor process (HWCVP). A simple and room temperature approach known as electrophoretic deposition (EPD) process was adopted for the deposition of graphene sheets on SiNWs. GO sheets on SiNWs were converted to reduced graphene oxide (rGO) by photo-reduction method. EPD parameters were optimized to get a uniform coating of rGO on SiNWs. It was observed that the rGO deposition is greatly influenced by the deposition time and the applied voltage in the EPD process. rGO deposition was confirmed by FEG-SEM and FEG-TEM, and the reduction of GO to rGO was verified by Raman, UV-Vis and Fourier transform infrared (FTIR) spectroscopy.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available