Simulation of reaction-diffusion between substrate and coating during vapor deposition processes

This work presents simulations of the solid state diffusion and reactions during deposition processes. Two cases are studied where the diffusion in and between coating and substrate is simulated. The processes simulated are in one case directed vapor deposition of Al and Ni on a precoated nickel-base superalloy, and in the other case chemical vapor deposition aluminization of a nickel-base superalloy. The simulations result in composition and phase-fraction profiles, which are presented and compared with experimental composition profiles. The simulation results are generally in good agreement with the experimental profiles.