4.8 Article

Nonvolatile Ferroelectric Memory Effect in Ultrathin -In2Se3

Journal

ADVANCED FUNCTIONAL MATERIALS
Volume 29, Issue 20, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.201808606

Keywords

2D ferroelectric; FeFET; nonvolatile memory

Funding

  1. National Key Research and Development Program of China [2017YFA0205004, 2017YFA0204904, 2018YFA0306600]
  2. National Natural Science Foundation of China [11674295, 11674299, 11374273, 11634011, 51732010]
  3. Fundamental Research Funds for the Central Universities [WK2340000082, WK2340000063, WK2060190084]
  4. Anhui Initiative in Quantum Information Technologies [AHY170000]
  5. Strategic Priority Research Program of Chinese Academy of Sciences [XDB30000000]
  6. China Government Youth 1000-Plan Talent Program

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High-density memory is integral in solid-state electronics. 2D ferroelectrics offer a new platform for developing ultrathin electronic devices with nonvolatile functionality. Recent experiments on layered -In2Se3 confirm its room-temperature out-of-plane ferroelectricity under ambient conditions. Here, a nonvolatile memory effect in a hybrid 2D ferroelectric field-effect transistor (FeFET) made of ultrathin -In2Se3 and graphene is demonstrated. The resistance of the graphene channel in the FeFET is effectively controllable and retentive due to the electrostatic doping, which stems from the electric polarization of the ferroelectric -In2Se3. The electronic logic bit can be represented and stored with different orientations of electric dipoles in the top-gate ferroelectric. The 2D FeFET can be randomly rewritten over more than 10(5) cycles without losing the nonvolatility. The approach demonstrates a prototype of rewritable nonvolatile memory with ferroelectricity in van der Waals 2D materials.

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