Journal
ADVANCES IN COLLOID AND INTERFACE SCIENCE
Volume 228, Issue -, Pages 105-122Publisher
ELSEVIER
DOI: 10.1016/j.cis.2015.11.012
Keywords
Micro-/nano-spherical lens photolithography; Monolayer colloidal crystal; Highly ordered nanostructure
Categories
Funding
- National Science Foundation of China [51173097, 91333109]
- National Key Basic Research Program of China [2013CB632900]
- Tsinghua University Initiative Scientific Research Program [20131089202]
- Tsinghua National Laboratory for Information Science and Technology (TNList) Cross-discipline Foundation
- Open Research Fund Program of State Key Laboratory of Low-Dimensional Quantum Physics [KF201516]
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Highly ordered nanostructures have gained substantial interest in the research community due to their fascinating properties and wide applications. Micro-/nano-spherical lens photolithography (SLPL) has been recognized as an inexpensive, inherently parallel, and high-throughput approach to the creation of highly ordered nanostructures. SLPL based on monolayer colloidal crystals (MCCs) of self-assembled colloidal micro-/nano-spheres have recently made remarkable progress in overcoming the constraints of conventional photolithography in terms of cost, feature size, tunability, and pattern complexity. In this review, we highlight the current state-of-the-art in this field with an emphasis on the fabrication of a variety of highly ordered nanostructures based on this technique and their demonstrated applications in light emitting diodes, nano-patterning semiconductors, and localized surface plasmon resonance devices. Finally, we present a perspective on the future development of MCC-based SLPL technique, including a discussion on the improvement of the quality of MCCs and the compatibility of this technique with other semiconductor micromachining process for nanofabrication. (C) 2015 Elsevier B.V. All rights reserved.
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