4.8 Article

Parallel Stitching of 2D Materials

Journal

ADVANCED MATERIALS
Volume 28, Issue 12, Pages 2322-2329

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201505070

Keywords

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Funding

  1. U.S. Army Research Office through the MIT Institute for Soldier Nanotechnologies [023674]
  2. National Science Foundation (NSF) [NSF/DMR 1004147]
  3. Department of Energy (DOE) [DE-SC0001299]
  4. Office of Naval Research (ONR) Presidential Early Career Awards for Scientists and Engineers (PECASE) program [021302-001]
  5. DOE-Basic Energy Sciences (BES)/Materials Science and Engineering (MSE) division [DE-AC02-98CH10886]
  6. Ministry of Science and Technology of the Republic of China [MOST 103-2112-M-007-001-MY3]
  7. National Science Foundation under NSF [ECS-0335765]
  8. Division Of Materials Research
  9. Direct For Mathematical & Physical Scien [1004147] Funding Source: National Science Foundation
  10. U.S. Department of Energy (DOE) [DE-SC0001299] Funding Source: U.S. Department of Energy (DOE)

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Diverse parallel stitched 2D heterostructures, including metal-semiconductor, semiconductor-semiconductor, and insulator-semiconductor, are synthesized directly through selective sowing of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. The methodology enables the large-scale fabrication of lateral hetero structures, which offers tremendous potential for its application in integrated circuits.

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