Journal
ADVANCED MATERIALS
Volume 28, Issue 42, Pages 9292-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201602900
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Funding
- Alexander von Humboldt Foundation
- MRSEC Program of the National Science Foundation [DMR 1121053]
- Office of Naval Research (ONR) [N000141110325]
- Institute for Collaborative Biotechnologies through U.S. Army Research Office [W911NF-09-0001]
- NSF Graduate Research Fellowship
- Development and Promotion of Science and Technology Talents Project, Royal Government of Thailand Fellowship
- PREM program of the National Science Foundation [DMR-1205194]
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Solution-exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet-printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.
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