Journal
ADVANCED MATERIALS
Volume 28, Issue 23, Pages 4658-4664Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201600112
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Funding
- Knut and Alice Wallenberg Foundation
- Chalmers Nanoscience and Nanotechnology Area of Advance
- Swedish Foundation for Strategic Research (SSF)
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A continuous-gradient approach of material evaporation is employed to fabricate nanostructures with varying geometric parameters, such as thickness, lateral positioning, and orientation on a single substrate. The method developed for mask lithography allows continuous tuning of the physical properties of a sample. The technique is highly valuable in simplifying the overall optimization process for constructing metasurfaces.
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