4.6 Article

Single Crystal Diamond Deposited by Dual Radio-Frequency Plasma Jet CVD with High Growth Rate

Journal

CRYSTALS
Volume 9, Issue 1, Pages -

Publisher

MDPI
DOI: 10.3390/cryst9010032

Keywords

dual radio frequency; inductive coupled plasma jet; single crystal diamond; chemical vapor deposition (CVD); methane flux; growth rate

Funding

  1. National Natural Science Foundation of China [50128790]
  2. Hundred program of Chinese Academy of Sciences, Hundred Talents Program of the Chinese Academy of Sciences, Scientific Research Equipment Project of the Chinese Academy of Sciences [yz201356]
  3. Hebei Science and Technology Plan [14291110D]
  4. Beijing Science and Technology Project [Z151100003315024]

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Single crystal diamonds were deposited on high pressure high temperature (HPHT) substrate with high growth rate, up to 18.5 m/h, by using dual radio-frequency inductive coupled plasma jet. The methane flux was found to influence the growth rate of single crystal diamond. The reason for this might be ascribed to the electron temperature increase, raising the flux of methane, based on the plasma diagnosis results by optical emission spectra (OES). The results of Raman spectroscopy and the X-ray rocking-curve indicated that as-deposited diamonds are of good quality.

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