4.6 Article

Layer-Dependent Dielectric Function of Wafer-Scale 2D MoS2

Journal

ADVANCED OPTICAL MATERIALS
Volume 7, Issue 2, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adom.201801250

Keywords

layer-dependent dielectric function; spectroscopic ellipsometry; two-step method; wafer-scale 2D MoS2

Funding

  1. National Natural Science Foundation of China [51727809, 51525502, 51805193, 51775217]
  2. China Postdoctoral Science Foundation [2016M602288, 2017T100546]
  3. National Science and Technology Major Project of China [2017ZX02101006-004]
  4. National Science Foundation of Hubei Province of China [2018CFB559, 2018CFA057]

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Wafer-scale, high-quality, and layer-controlled 2D MoS2 films on c-sapphire are synthesized by an innovative two-step method. The dielectric functions of MoS2 ranging from the monolayer to the bulk are investigated by spectroscopic ellipsometry over an ultra-broadband (0.73-6.42 eV). Up to five critical points (CPs) in the dielectric function spectra are precisely distinguished by CP analysis, and their physical origins are identified in the band structures with the help of first-principles calculations. Results demonstrate that the center energies of these CPs exhibit intriguing layer dependency, which are interpreted by the intrinsic layer-dependent transitions in MoS2. Specially, the change in the imaginary part of the dielectric functions versus the thickness exhibits a W like curve, and the two valley bottoms appear at about four-layer and 10-layer respectively. These complex fluctuations are attributed to the alternating domination of the decreasing excitonic effect, the increasing joint density of states, and the mass density increase in relative thick MoS2 samples.

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