4.4 Article

Crystallography characteristics of tetragonal nano-zirconia films under various oxygen partial pressure

Journal

SURFACE ENGINEERING
Volume 35, Issue 7, Pages 618-626

Publisher

TAYLOR & FRANCIS LTD
DOI: 10.1080/02670844.2018.1555913

Keywords

Zirconia thin films; oxygen partial pressure; crystallite size; atomic force microscopy; surface roughness; correlation function

Funding

  1. Office of Graduate Studies of the University of Bu Ali Sina

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Structural features and surface morphology of ZrO thin films electron beam evaporation-deposited under various oxygen partial pressure were studied. It was indicated tetragonal phase for all samples by XRD pattern. The highest crystallite size calculated via Scherrer equation is observed at the oxygen partial pressure of mbar; that was in good agreement with the high-resolution surface images obtained by FE-SEM. The photoluminescence spectrum of t-zirconia films exhibits an intense peak at 351 nm, this emission decrease in intensity by elevation of oxygen partial pressures. Surface roughness profile and scaling analyses were made by surface measurements of atomic force microscopy with using the height-height correlation function. The roughness has the maximum value at the highest oxygen partial pressure. It has been found that with the increase of oxygen partial pressures, lateral correlation length of samples increased, and fractal dimension changed within the range of 2.20-2.26.

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