Journal
ACTA MATERIALIA
Volume 104, Issue -, Pages 223-227Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.actamat.2015.11.049
Keywords
beta-W; Nucleation; Adsorption; Thin films; Metastable phases
Funding
- NSF [DMR-1411160]
- U.S. Department of Energy, Office of Basic Energy Sciences [DE-SC0012704]
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [1411160] Funding Source: National Science Foundation
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beta-W is a metastable, topologically close-packed phase with the A15 structure. The deposition of beta-W, using N-2 as the impurity gas introduced into the sputtering chamber, is reported and a mechanism for beta-W formation is proposed. Molecules of the impurity gas in the chamber are adsorbed onto the surface during the deposition process and act as nucleation sites for the formation of beta-W. The proposed mechanism is supported by the dependence of beta-W phase fraction in sputter deposited films on pressure of N-2 and on substrate temperature. (C) 2015 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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